Abstract
The noise margin is one of the fundamental metrics in evaluating the viability and robustness of digital circuits. An analytical model of amorphous-silicon digital-circuit noise margin was developed, including the effects of circuit aging. The threshold voltage of a-Si:H transistors increases over time with electrical stress, degrading the performance and eventually leading to circuit wear-out. Since static and dynamic inverters are the basic digital-circuit design elements, they are the basis for this analysis. The analytical model is verified with experimental measurements. The lifetime of dynamic a-Si:H digital circuits is found to exceed the lifetime for static a-Si:H circuits by a factor of 2-3. Although the lifetimes are relatively short (∼105 sec) and under continuous electrical stress, they are sufficient for low-duty-cycle applications.
Original language | English (US) |
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Pages (from-to) | 251-259 |
Number of pages | 9 |
Journal | Journal of the Society for Information Display |
Volume | 15 |
Issue number | 4 |
DOIs | |
State | Published - Apr 2007 |
Keywords
- Amorphous-silicon thin-film transistors
- Circuit aging
- Noise margin
- Threshold-voltage shift
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering