Morphological and optical properties of Si nanostructures imbedded in SiO2 and Si3N4 films grown by single source chemical vapor deposition

L. Torrison; J. Tolle; David Smith; C. Poweleit; Jose Menendez; M. M. Mitan; Terry Alford; John Kouvetakis

doi:10.1063/1.1525046

Morphological and optical properties of Si nanostructures imbedded in SiO₂ and Si₃N₄ films grown by single source chemical vapor deposition

L. Torrison, J. Tolle, David Smith, C. Poweleit, Jose Menendez, M. M. Mitan, Terry Alford, John Kouvetakis

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

Morphological and optical properties of silicon nanostructure imbedded in silica and silicon nitride films grown by single source chemical vapor deposition (CVD) were analyzed. Growth reactions of the single source precursors in a ultrahigh vacuum (UHV)-CVD reactor yielded amorphous films. Room temperature photoluminescence (PL) studies showed that nanocrystals emit light in visible spectral region between 580 and 650 nm.

Original language	English (US)
Pages (from-to)	7475-7480
Number of pages	6
Journal	Journal of Applied Physics
Volume	92
Issue number	12
DOIs	https://doi.org/10.1063/1.1525046
State	Published - Dec 15 2002

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Physics and Astronomy(all)

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abstract = "Morphological and optical properties of silicon nanostructure imbedded in silica and silicon nitride films grown by single source chemical vapor deposition (CVD) were analyzed. Growth reactions of the single source precursors in a ultrahigh vacuum (UHV)-CVD reactor yielded amorphous films. Room temperature photoluminescence (PL) studies showed that nanocrystals emit light in visible spectral region between 580 and 650 nm.",

author = "L. Torrison and J. Tolle and David Smith and C. Poweleit and Jose Menendez and Mitan, {M. M.} and Terry Alford and John Kouvetakis",

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T1 - Morphological and optical properties of Si nanostructures imbedded in SiO2 and Si3N4 films grown by single source chemical vapor deposition

AU - Torrison, L.

AU - Tolle, J.

AU - Smith, David

AU - Poweleit, C.

AU - Menendez, Jose

AU - Mitan, M. M.

AU - Alford, Terry

AU - Kouvetakis, John

PY - 2002/12/15

Y1 - 2002/12/15

N2 - Morphological and optical properties of silicon nanostructure imbedded in silica and silicon nitride films grown by single source chemical vapor deposition (CVD) were analyzed. Growth reactions of the single source precursors in a ultrahigh vacuum (UHV)-CVD reactor yielded amorphous films. Room temperature photoluminescence (PL) studies showed that nanocrystals emit light in visible spectral region between 580 and 650 nm.

AB - Morphological and optical properties of silicon nanostructure imbedded in silica and silicon nitride films grown by single source chemical vapor deposition (CVD) were analyzed. Growth reactions of the single source precursors in a ultrahigh vacuum (UHV)-CVD reactor yielded amorphous films. Room temperature photoluminescence (PL) studies showed that nanocrystals emit light in visible spectral region between 580 and 650 nm.

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IS - 12

ER -

Morphological and optical properties of Si nanostructures imbedded in SiO₂ and Si₃N₄ films grown by single source chemical vapor deposition

Abstract

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