Microstructural and chemical characterization of the Inconel/Ti(n) thin film and multilayer system

P. E. Diehl; Hans K. Pew; D. W. Madsen; John A. Leavitt; David Smith

doi:10.3233/XST-1995-5110

Microstructural and chemical characterization of the Inconel/Ti(n) thin film and multilayer system

P. E. Diehl, Hans K. Pew, D. W. Madsen, John A. Leavitt, David Smith

Electrical Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.

Original language	English (US)
Pages (from-to)	121-158
Number of pages	38
Journal	Journal of X-Ray Science and Technology
Volume	5
Issue number	1
DOIs	https://doi.org/10.3233/XST-1995-5110
State	Published - 1995

ASJC Scopus subject areas

Radiation
Instrumentation
Radiology Nuclear Medicine and imaging
Condensed Matter Physics
Electrical and Electronic Engineering

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abstract = "Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.",

author = "Diehl, {P. E.} and Pew, {Hans K.} and Madsen, {D. W.} and Leavitt, {John A.} and David Smith",

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AU - Diehl, P. E.

AU - Pew, Hans K.

AU - Madsen, D. W.

AU - Leavitt, John A.

AU - Smith, David

PY - 1995

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N2 - Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.

AB - Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.

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Microstructural and chemical characterization of the Inconel/Ti(n) thin film and multilayer system

Abstract

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