Micromachined on-wafer probes

Theodore J. Reck, Lihan Chen, Chunhu Zhang, Christopher Groppi, Haiyong Xu, Alex Arsenovic, N. Scott Barker, Arthur Lichtenberger, Robert M. Weikle

Research output: Chapter in Book/Report/Conference proceedingConference contribution

30 Scopus citations


A micromachined on-wafer probe is designed, fabricated and measured at W-Band as a proof of concept for probes operating at sub-millimeter wavelengths. A fabrication process is developed to create devices that combine a waveguide probe with a GSG probe tip on a 15 μm silicon substrate. This device is housed in a metal machined waveguide block that provides mechanical support for the probe and connection to a waveguide flange. Load-cell measurements show a DC contact resistance below 0.07 Ω with a force of 1 mN. A two-tier TRL calibration characterizes the operation of the electromagnetic design and an insertion loss of 1.75 dB is achieved; this is comparable with commercial probes operating in the same band.

Original languageEnglish (US)
Title of host publication2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Number of pages4
StatePublished - Oct 15 2010
Event2010 IEEE MTT-S International Microwave Symposium, MTT 2010 - Anaheim, CA, United States
Duration: May 23 2010May 28 2010

Publication series

NameIEEE MTT-S International Microwave Symposium Digest
ISSN (Print)0149-645X


Other2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Country/TerritoryUnited States
CityAnaheim, CA


  • CPW
  • Micromachining
  • On-wafer probes
  • Waveguide

ASJC Scopus subject areas

  • Radiation
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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