Micromachined on-wafer probes

Theodore J. Reck; Lihan Chen; Chunhu Zhang; Christopher Groppi; Haiyong Xu; Alex Arsenovic; N. Scott Barker; Arthur Lichtenberger; Robert M. Weikle

doi:10.1109/MWSYM.2010.5517580

Micromachined on-wafer probes

Theodore J. Reck, Lihan Chen, Chunhu Zhang, Christopher Groppi, Haiyong Xu, Alex Arsenovic, N. Scott Barker, Arthur Lichtenberger, Robert M. Weikle

Earth and Space Exploration, School of (SESE)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

30 Scopus citations

Abstract

A micromachined on-wafer probe is designed, fabricated and measured at W-Band as a proof of concept for probes operating at sub-millimeter wavelengths. A fabrication process is developed to create devices that combine a waveguide probe with a GSG probe tip on a 15 μm silicon substrate. This device is housed in a metal machined waveguide block that provides mechanical support for the probe and connection to a waveguide flange. Load-cell measurements show a DC contact resistance below 0.07 Ω with a force of 1 mN. A two-tier TRL calibration characterizes the operation of the electromagnetic design and an insertion loss of 1.75 dB is achieved; this is comparable with commercial probes operating in the same band.

Original language	English (US)
Title of host publication	2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Pages	65-68
Number of pages	4
DOIs	https://doi.org/10.1109/MWSYM.2010.5517580
State	Published - Oct 15 2010
Event	2010 IEEE MTT-S International Microwave Symposium, MTT 2010 - Anaheim, CA, United States Duration: May 23 2010 → May 28 2010

Publication series

Name	IEEE MTT-S International Microwave Symposium Digest
ISSN (Print)	0149-645X

Other

Other	2010 IEEE MTT-S International Microwave Symposium, MTT 2010
Country/Territory	United States
City	Anaheim, CA
Period	5/23/10 → 5/28/10

Keywords

CPW
Micromachining
On-wafer probes
Waveguide

ASJC Scopus subject areas

Radiation
Condensed Matter Physics
Electrical and Electronic Engineering

Access to Document

10.1109/MWSYM.2010.5517580

Cite this

Reck, TJ, Chen, L, Zhang, C, Groppi, C, Xu, H, Arsenovic, A, Barker, NS, Lichtenberger, A & Weikle, RM 2010, Micromachined on-wafer probes. in 2010 IEEE MTT-S International Microwave Symposium, MTT 2010., 5517580, IEEE MTT-S International Microwave Symposium Digest, pp. 65-68, 2010 IEEE MTT-S International Microwave Symposium, MTT 2010, Anaheim, CA, United States, 5/23/10. https://doi.org/10.1109/MWSYM.2010.5517580

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abstract = "A micromachined on-wafer probe is designed, fabricated and measured at W-Band as a proof of concept for probes operating at sub-millimeter wavelengths. A fabrication process is developed to create devices that combine a waveguide probe with a GSG probe tip on a 15 μm silicon substrate. This device is housed in a metal machined waveguide block that provides mechanical support for the probe and connection to a waveguide flange. Load-cell measurements show a DC contact resistance below 0.07 Ω with a force of 1 mN. A two-tier TRL calibration characterizes the operation of the electromagnetic design and an insertion loss of 1.75 dB is achieved; this is comparable with commercial probes operating in the same band.",

keywords = "CPW, Micromachining, On-wafer probes, Waveguide",

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AU - Reck, Theodore J.

AU - Chen, Lihan

AU - Zhang, Chunhu

AU - Groppi, Christopher

AU - Xu, Haiyong

AU - Arsenovic, Alex

AU - Barker, N. Scott

AU - Lichtenberger, Arthur

AU - Weikle, Robert M.

PY - 2010/10/15

Y1 - 2010/10/15

N2 - A micromachined on-wafer probe is designed, fabricated and measured at W-Band as a proof of concept for probes operating at sub-millimeter wavelengths. A fabrication process is developed to create devices that combine a waveguide probe with a GSG probe tip on a 15 μm silicon substrate. This device is housed in a metal machined waveguide block that provides mechanical support for the probe and connection to a waveguide flange. Load-cell measurements show a DC contact resistance below 0.07 Ω with a force of 1 mN. A two-tier TRL calibration characterizes the operation of the electromagnetic design and an insertion loss of 1.75 dB is achieved; this is comparable with commercial probes operating in the same band.

AB - A micromachined on-wafer probe is designed, fabricated and measured at W-Band as a proof of concept for probes operating at sub-millimeter wavelengths. A fabrication process is developed to create devices that combine a waveguide probe with a GSG probe tip on a 15 μm silicon substrate. This device is housed in a metal machined waveguide block that provides mechanical support for the probe and connection to a waveguide flange. Load-cell measurements show a DC contact resistance below 0.07 Ω with a force of 1 mN. A two-tier TRL calibration characterizes the operation of the electromagnetic design and an insertion loss of 1.75 dB is achieved; this is comparable with commercial probes operating in the same band.

KW - CPW

KW - Micromachining

KW - On-wafer probes

KW - Waveguide

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T3 - IEEE MTT-S International Microwave Symposium Digest

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BT - 2010 IEEE MTT-S International Microwave Symposium, MTT 2010

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ER -

Micromachined on-wafer probes

Abstract

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Keywords

ASJC Scopus subject areas

Access to Document

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