Kinetic lattice Monte Carlo simulation of facet growth rate

Zhiyong Wang, Youhong Li, James Adams

Research output: Contribution to journalArticlepeer-review

56 Scopus citations


We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed.

Original languageEnglish (US)
Pages (from-to)51-63
Number of pages13
JournalSurface Science
Issue number1
StatePublished - Apr 1 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


Dive into the research topics of 'Kinetic lattice Monte Carlo simulation of facet growth rate'. Together they form a unique fingerprint.

Cite this