Investigation of chromium nitridation using ion beam resonance analysis

S. W. Russell, A. E. Bair, M. J. Rack, D. Adams, R. L. Spreitzer, Terry Alford, Robert Culbertson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations


We investigate the nitridation of chromium films in an NH 3 ambient at 500°C. Rutherford backscattering spectrometry using 2.0 MeV He 2+ was utilized to determine the compositions of thick reacted layers and to provide calibration for the other techniques. In addition, analysis was performed using the 14N(α,α) 14N resonance at 3.72 MeV in order to enhance sensitivity to nitrogen. Sputter-deposited TiN was used as a calibration for the cross section σ for this resonance over the energy range 3.05-3.85 MeV and compared to the literature value. We find that analysis just above the peak in the resonance provides excellent sensitivity to N concentration in the nitride layers. This approach may be readily used in conjunction with 2.0 MeV backscattering to determine the overall composition and sample configuration. Auger electron spectroscopy was used to provide more depth sensitivity in compositional profiling and to monitor the oxygen impurity distribution. X-ray diffraction was used to identify phases in both as-deposited and annealed films.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Number of pages6
StatePublished - 1994
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 4 1994Apr 8 1994


OtherProceedings of the 1994 MRS Spring Meeting
CitySan Francisco, CA, USA

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials


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