Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

V. A. Burrows

doi:10.1016/0038-1101(92)90227-4

Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

V. A. Burrows

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

Original language	English (US)
Pages (from-to)	231-238
Number of pages	8
Journal	Solid State Electronics
Volume	35
Issue number	3
DOIs	https://doi.org/10.1016/0038-1101(92)90227-4
State	Published - Mar 1992

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Materials Chemistry
Electrical and Electronic Engineering

Access to Document

10.1016/0038-1101(92)90227-4

Cite this

@article{f5bd1456e1cf428aab71408adc561ac6,

title = "Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films",

abstract = "Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.",

author = "Burrows, \{V. A.\}",

year = "1992",

month = mar,

doi = "10.1016/0038-1101(92)90227-4",

language = "English (US)",

volume = "35",

pages = "231--238",

journal = "Solid State Electronics",

issn = "0038-1101",

publisher = "Elsevier Ltd",

number = "3",

}

TY - JOUR

T1 - Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

AU - Burrows, V. A.

PY - 1992/3

Y1 - 1992/3

N2 - Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

AB - Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

UR - https://www.scopus.com/pages/publications/0026837037

UR - https://www.scopus.com/pages/publications/0026837037#tab=citedBy

U2 - 10.1016/0038-1101(92)90227-4

DO - 10.1016/0038-1101(92)90227-4

M3 - Article

AN - SCOPUS:0026837037

SN - 0038-1101

VL - 35

SP - 231

EP - 238

JO - Solid State Electronics

JF - Solid State Electronics

IS - 3

ER -

Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this