Increased field-emission site density from regrown carbon nanotube films

Y. Y. Wang; S. Gupta; M. Liang; R. J. Nemanich

doi:10.1063/1.1897836

Increased field-emission site density from regrown carbon nanotube films

Y. Y. Wang, S. Gupta, M. Liang, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

Electron field-emission properties of as-grown, etched, and regrown carbon nanotube thin films were investigated. The aligned carbon nanotube films were deposited by the microwave plasma-assisted chemical vapor deposition technique. The surface of the as-grown film contained a carbon nanotube mat of amorphous carbon and entangled nanotubes with some tubes protruding from the surface. Hydrogen plasma etching resulted in the removal of the surface layer, and regrowth on the etched surface displayed the formation of a new carbon nanotube mat. The emission site density and the current-voltage dependence of the field emission from all of the samples were analyzed. The results showed that the as-grown sample had a few strong emission spots and a relatively high emission current density (~20 μA cm2 at 1 Vμm), while the regrown sample exhibited a significantly increased emission site density.

Original language	English (US)
Article number	104309
Journal	Journal of Applied Physics
Volume	97
Issue number	10
DOIs	https://doi.org/10.1063/1.1897836
State	Published - May 15 2005
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.1897836

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@article{64460933a2fe486eb1c551cd4029f5ef,

title = "Increased field-emission site density from regrown carbon nanotube films",

abstract = "Electron field-emission properties of as-grown, etched, and regrown carbon nanotube thin films were investigated. The aligned carbon nanotube films were deposited by the microwave plasma-assisted chemical vapor deposition technique. The surface of the as-grown film contained a carbon nanotube mat of amorphous carbon and entangled nanotubes with some tubes protruding from the surface. Hydrogen plasma etching resulted in the removal of the surface layer, and regrowth on the etched surface displayed the formation of a new carbon nanotube mat. The emission site density and the current-voltage dependence of the field emission from all of the samples were analyzed. The results showed that the as-grown sample had a few strong emission spots and a relatively high emission current density (~20 μA cm2 at 1 Vμm), while the regrown sample exhibited a significantly increased emission site density.",

author = "Wang, {Y. Y.} and S. Gupta and M. Liang and Nemanich, {R. J.}",

note = "Funding Information: We acknowledge Dr. R. Collazo (Department of Materials Science and Engineering, NC State University) for his fruitful suggestions in this work. This research is supported in part by the TEC ONR-MURI and the DOE-CESP center at Argonne National Laboratory.",

year = "2005",

month = may,

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doi = "10.1063/1.1897836",

language = "English (US)",

volume = "97",

journal = "Journal of Applied Physics",

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TY - JOUR

T1 - Increased field-emission site density from regrown carbon nanotube films

AU - Wang, Y. Y.

AU - Gupta, S.

AU - Liang, M.

AU - Nemanich, R. J.

N1 - Funding Information: We acknowledge Dr. R. Collazo (Department of Materials Science and Engineering, NC State University) for his fruitful suggestions in this work. This research is supported in part by the TEC ONR-MURI and the DOE-CESP center at Argonne National Laboratory.

PY - 2005/5/15

Y1 - 2005/5/15

N2 - Electron field-emission properties of as-grown, etched, and regrown carbon nanotube thin films were investigated. The aligned carbon nanotube films were deposited by the microwave plasma-assisted chemical vapor deposition technique. The surface of the as-grown film contained a carbon nanotube mat of amorphous carbon and entangled nanotubes with some tubes protruding from the surface. Hydrogen plasma etching resulted in the removal of the surface layer, and regrowth on the etched surface displayed the formation of a new carbon nanotube mat. The emission site density and the current-voltage dependence of the field emission from all of the samples were analyzed. The results showed that the as-grown sample had a few strong emission spots and a relatively high emission current density (~20 μA cm2 at 1 Vμm), while the regrown sample exhibited a significantly increased emission site density.

AB - Electron field-emission properties of as-grown, etched, and regrown carbon nanotube thin films were investigated. The aligned carbon nanotube films were deposited by the microwave plasma-assisted chemical vapor deposition technique. The surface of the as-grown film contained a carbon nanotube mat of amorphous carbon and entangled nanotubes with some tubes protruding from the surface. Hydrogen plasma etching resulted in the removal of the surface layer, and regrowth on the etched surface displayed the formation of a new carbon nanotube mat. The emission site density and the current-voltage dependence of the field emission from all of the samples were analyzed. The results showed that the as-grown sample had a few strong emission spots and a relatively high emission current density (~20 μA cm2 at 1 Vμm), while the regrown sample exhibited a significantly increased emission site density.

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Increased field-emission site density from regrown carbon nanotube films

Abstract

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