How epitaxial are Pd2SiSi interfaces?

Z. Liliental, Ray Carpenter, R. Tuenge

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Pd2Si layers produced by evaporation or sputtering onto silicon substrates were examined by high resolution electron microscopy, microdiffraction, X-ray, energy loss and Auger spectroscopy. The SiPd2Si interfaces produced by evaporation were in all cases rougher and more polycrystalline than those produced by sputtering. X-ray microanalysis showed the predictable variation in palladium distribution across the interface but quantification did not produce the expected palladium-to-silicon ratios, primarily because of probe broadening and X-ray-induced fluorescence. Energy loss spectra showed plasmon energy shifts and changes in Si L edge shape due to bond formation with palladium. Auger data provided evidence for a small amount of oxygen at the SiPd2 interface. Electrical measurements of the ideality factor for Schottky barriers made from these materials produced higher values for the rougher evaporation-formed interfaces consistent with interface-roughness-induced scattering and carrier recombination.

Original languageEnglish (US)
Pages (from-to)17-29
Number of pages13
JournalThin Solid Films
Issue number1-2
StatePublished - Jun 17 1983

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


Dive into the research topics of 'How epitaxial are Pd2SiSi interfaces?'. Together they form a unique fingerprint.

Cite this