Evolution of optical phonons in epitaxial Ge1−ySny structures

Young Chan Kim, Taegeon Lee, Mee Yi Ryu, John Kouvetakis, Heesuk Rho

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


We report polarized Raman scattering results of Ge1−ySny (0 ≤ y ≤ 0.09) epitaxial layers grown on Ge-buffered Si substrates. Polarized Raman spectra from the sample surfaces revealed strong Ge–Ge longitudinal optical (LO) phonon responses. The Ge–Ge LO(z) phonon wavenumber decreased systematically as the Sn content increased. Linear fitting results of the Ge–Ge LO(z) phonon wavenumber shifts as a function of Sn content suggested that a partial strain relaxation occurred in the Ge1−ySny layers. Spatially resolved Raman mapping measurements from the cross section of a Ge0.938Sn0.062 samplev showed that the peak wavenumber of the Ge–Ge transverse optical phonon decreased gradually toward the top surface, providing direct evidence that the residual built-in strain initially formed at the Ge0.938Sn0.062/Ge interface tended to relax gradually along the growth direction. Further, a hydrogen inductively coupled plasma treatment induced a greater homogeneous strain profile in the Ge0.938Sn0.062 layer.

Original languageEnglish (US)
Pages (from-to)2305-2310
Number of pages6
JournalJournal of Raman Spectroscopy
Issue number11
StatePublished - Nov 2020


  • germanium tin
  • optical phonon
  • polarized Raman spectroscopy
  • strain
  • stress

ASJC Scopus subject areas

  • General Materials Science
  • Spectroscopy


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