Erratum: Continuous in situ X-ray reflectivity investigation on epitaxial growth of InGaN by metalorganic vapor phase epitaxy (Journal of Crystal Growth (2014) 407 (68-73))

Guangxu Ju; Shingo Fuchi; Masao Tabuchi; Hiroshi Amanoa; Yoshikazu Takeda

doi:10.1016/j.jcrysgro.2015.02.088

Erratum: Continuous in situ X-ray reflectivity investigation on epitaxial growth of InGaN by metalorganic vapor phase epitaxy (Journal of Crystal Growth (2014) 407 (68-73))

Guangxu Ju, Shingo Fuchi, Masao Tabuchi, Hiroshi Amanoa, Yoshikazu Takeda

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Pages (from-to)	185
Number of pages	1
Journal	Journal of Crystal Growth
Volume	418
DOIs	https://doi.org/10.1016/j.jcrysgro.2015.02.088
State	Published - May 15 2015
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Inorganic Chemistry
Materials Chemistry

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10.1016/j.jcrysgro.2015.02.088

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title = "Erratum: Continuous in situ X-ray reflectivity investigation on epitaxial growth of InGaN by metalorganic vapor phase epitaxy (Journal of Crystal Growth (2014) 407 (68-73))",

author = "Guangxu Ju and Shingo Fuchi and Masao Tabuchi and Hiroshi Amanoa and Yoshikazu Takeda",

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pages = "185",

journal = "Journal of Crystal Growth",

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T2 - Continuous in situ X-ray reflectivity investigation on epitaxial growth of InGaN by metalorganic vapor phase epitaxy (Journal of Crystal Growth (2014) 407 (68-73))

AU - Ju, Guangxu

AU - Fuchi, Shingo

AU - Tabuchi, Masao

AU - Amanoa, Hiroshi

AU - Takeda, Yoshikazu

PY - 2015/5/15

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DO - 10.1016/j.jcrysgro.2015.02.088

M3 - Comment/debate

AN - SCOPUS:84939959448

SN - 0022-0248

VL - 418

SP - 185

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

ER -

Erratum: Continuous in situ X-ray reflectivity investigation on epitaxial growth of InGaN by metalorganic vapor phase epitaxy (Journal of Crystal Growth (2014) 407 (68-73))

ASJC Scopus subject areas

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