Epitaxial film growth of zirconium diboride on Si(0 0 1)

R. Roucka, J. Tolle, Andrew Chizmeshya, I. S T Tsong, John Kouvetakis

Research output: Contribution to journalArticlepeer-review

15 Scopus citations


The structure of epitaxial ZrB2 films grown on Si(0 0 1) substrates via the thermal decomposition of the unimolecular precursor Zr(BH4)4 was studied by X-ray diffraction, atomic force microscopy, and cross-sectional transmission electron microscopy (XTEM). In spite of the large lattice mismatch between the Si(0 0 1) substrate and ZrB 2, epitaxy occurs via a coincidence-misfit mechanism in which the strain between film and substrate is accommodated by edge dislocations along the film-substrate interface. While the growth axis of the ZrB2 film lies along the [1 1 0 0 ] direction, i.e. [1 1 0 0]ZrB2//[001]Si, the epitaxy produces two orthogonal domains as the result of a 6:5 misfit for [1 1 2 0]ZrB2//[1 1 0]Si and a 13:12 misfit for [0 0 0 1;]ZrB2//[1 1 0]Si along the same direction on the interface plane. These domains take the form of two-dimensional rectangular islands orthogonal to each other. The island-substrate and island-island interfaces were examined in detail with high-resolution XTEM and compared with theoretical models.

Original languageEnglish (US)
Pages (from-to)364-371
Number of pages8
JournalJournal of Crystal Growth
Issue number1-4
StatePublished - Apr 15 2005


  • A1. Interfaces
  • A1. Substrates
  • A1. Surfaces
  • A3. Molecular beam epitaxy

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


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