Effect of thermal ramping and annealing conditions on defect formation in oxygen implanted silicon-on-insulator material

Stephen Krause, J. C. Park, J. D. Lee, M. El-Ghor, P. Roitman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations
Original languageEnglish (US)
Title of host publication1992 IEEE International SOI Conference, SOI 1992 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages2
ISBN (Electronic)0780307763
StatePublished - 1992
Event1992 IEEE International SOI Conference, SOI 1992 - Ponte Vedra Beach, United States
Duration: Oct 6 1992Oct 8 1992

Publication series

NameProceedings - IEEE International SOI Conference
ISSN (Print)1078-621X


Conference1992 IEEE International SOI Conference, SOI 1992
Country/TerritoryUnited States
CityPonte Vedra Beach

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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