Effect of inactivated dopants clusters and processing parameters on electrical properties of indium tin oxide on plastic substrates

Hauk Han, Jay Lewis, Terry Alford

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Indium tin oxide (ITO) thin films were deposited on polyethylene napthalate (PEN) by rf sputtering using different rf powers (60 and 120 W) and at different substrate temperatures (room temperature and 100°C). Rutherford backscattering spectrometry was used to determine the oxygen content in the films. Hall effect measurements were used to evaluate the electrical properties. In this paper the influence of defect structure, sputtering conditions, and the effect of annealing on the electrical and optical properties of ITO on PEN have been investigated. Electrical propeities such as carrier concentration, mobility, and resistivity of the ITO films varied with rf power and substrate temperature. The electrical properties of the films changed after annealing in air. This study also describes how the as-deposited amorphous ITO changes from amorphous to crystalline as a result of heat treatment, and investigates the effects of Sn defect clustering on electrical and optical properties of the ITO films.

Original languageEnglish (US)
Title of host publicationSynthesis and Metrology of Nanoscale Oxides and Thin Films
Pages174-179
Number of pages6
StatePublished - Dec 1 2008
Event2008 MRS Spring Meeting - San Francisco, CA, United States
Duration: Mar 24 2008Mar 28 2008

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1074
ISSN (Print)0272-9172

Other

Other2008 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period3/24/083/28/08

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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