Contact resistance of silicon-polysilicon interconnection for different current-flow geometries

A. J. Walton; R. Holwill; J. M. Robertson

doi:10.1049/el:19850009

Contact resistance of silicon-polysilicon interconnection for different current-flow geometries

A. J. Walton
, R. Holwill
, J. M. Robertson

Arizona State University

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The relationship between contact window dimensions, specific contact resistivity pc and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ρ_c starts to become the dominant factor giving contact resistances independent of the direction of current flow.

Original language	English (US)
Pages (from-to)	13-14
Number of pages	2
Journal	Electronics Letters
Volume	21
Issue number	1
DOIs	https://doi.org/10.1049/el:19850009
State	Published - Jan 3 1985

Keywords

Contact resistance
Integrated circuits

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1049/el:19850009

Cite this

@article{8620bb58f05043fe99c9b577211fc5f9,

title = "Contact resistance of silicon-polysilicon interconnection for different current-flow geometries",

abstract = "The relationship between contact window dimensions, specific contact resistivity pc and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ρc starts to become the dominant factor giving contact resistances independent of the direction of current flow.",

keywords = "Contact resistance, Integrated circuits",

author = "Walton, \{A. J.\} and R. Holwill and Robertson, \{J. M.\}",

year = "1985",

month = jan,

day = "3",

doi = "10.1049/el:19850009",

language = "English (US)",

volume = "21",

pages = "13--14",

journal = "Electronics Letters",

issn = "0013-5194",

publisher = "John Wiley \& Sons Inc.",

number = "1",

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TY - JOUR

T1 - Contact resistance of silicon-polysilicon interconnection for different current-flow geometries

AU - Walton, A. J.

AU - Holwill, R.

AU - Robertson, J. M.

PY - 1985/1/3

Y1 - 1985/1/3

N2 - The relationship between contact window dimensions, specific contact resistivity pc and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ρc starts to become the dominant factor giving contact resistances independent of the direction of current flow.

AB - The relationship between contact window dimensions, specific contact resistivity pc and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ρc starts to become the dominant factor giving contact resistances independent of the direction of current flow.

KW - Contact resistance

KW - Integrated circuits

UR - https://www.scopus.com/pages/publications/0022418014

UR - https://www.scopus.com/pages/publications/0022418014#tab=citedBy

U2 - 10.1049/el:19850009

DO - 10.1049/el:19850009

M3 - Article

AN - SCOPUS:0022418014

SN - 0013-5194

VL - 21

SP - 13

EP - 14

JO - Electronics Letters

JF - Electronics Letters

IS - 1

ER -

Contact resistance of silicon-polysilicon interconnection for different current-flow geometries

Abstract

Keywords

ASJC Scopus subject areas

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