Characterization of thin films, interfaces and surfaces by high-resolution electron microscopy

David Smith, Z. G. Li, Ping Lu, Martha McCartney, S. C Y Tsen

Research output: Contribution to journalArticlepeer-review

10 Scopus citations


Recent applications of high-resolution electron microscopy in our laboratory to the characterization of thin films, interfaces and surfaces are described. The information typically available using this technique about thin films is illustrated by studies of multiple quantum wells, metallic superlattices, magnetic films and X-ray optical elements. The problems associated with imaging interfaces are discussed by reference to silicon/silicide interfaces and grain boundaries in metals. Finally, recent observations of semiconductor surface reconstructions and beam-induced reactions at oxide surfaces are briefly summarized.

Original languageEnglish (US)
Pages (from-to)169-179
Number of pages11
Issue number1-4
StatePublished - Aug 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation


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