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Atomistic simulations on reliability
Dragica Vasileska
, Nabil Ashraf
Electrical Engineering
Computational Nanoscience, Center for (CCN)
Solid State Electronics Research Center (CSSER)
Nano-Electronics, Arizona Institute of (AINE)
Photonics Innovation, Center for (CPhI)
Electrical, Computer, and Energy Engineering, School of (IAFSE-ECEE)
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Keyphrases
Threshold Voltage
100%
Atomistic Simulation
100%
Random Dopant Fluctuation
100%
Gate Length
100%
Ensemble Monte Carlo
100%
Current-voltage
66%
Simulation Study
66%
Random Telegraph Noise
66%
Fluctuation Pattern
66%
Drain Current
66%
Arizona State University
33%
On-state Current
33%
Monte Carlo Simulation
33%
Digital Circuits
33%
Device Physics
33%
Benchmark Performance
33%
Noise Effects
33%
MOSFET
33%
Interface Traps
33%
Computational Electronics
33%
Reliability Degradation
33%
Drive Current
33%
MOSFET Device
33%
Analytical Device
33%
Threshold Voltage Shift
33%
Statistical Variation
33%
Fluctuation Phenomena
33%
Statistical Fluctuations
33%
Monte Carlo Device Simulations
33%
Depletion Region
33%
Transconductance
33%
Random number
33%
Si-SiO2 Interface
33%
Inverted Region
33%
Impurity Effect
33%
Gate Width
33%
Discrete Impurity
33%
Analog Integrated Circuits
33%
Die-to-die
33%
Random Location
33%
Engineering
Dopants
100%
Atomistic Simulation
100%
Gate Length
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
66%
Current Drain
66%
Simulation Result
33%
Metrics
33%
Research Group
33%
Digital Integrated Circuits
33%
Analog Integrated Circuits
33%
Statistical Variation
33%
Depletion Region
33%
Random Number
33%
Gate Width
33%
Silicon Dioxide
33%
Interface Trap
33%
Current Drive
33%
Material Science
Doping (Additives)
100%
Metal-Oxide-Semiconductor Field-Effect Transistor
66%
Electronic Circuit
33%