Abstract
A discussion about the atomic arrangement at the AlN/Si (111) interface was presented. The investigation of the atomic arrangement was done using high-resolution electron microscopy. The observation of crystallographically abrupt interface along most of the epilayer indicated that the AlN/Si interface was thermodynamically stable and of high crystalline quality.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 860-862 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 5 |
| DOIs | |
| State | Published - Aug 4 2003 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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