Approaching the resolution limit of nanometer-scale electron beam-induced deposition

Willem F. Van Dorp; Bob Van Someren; Cornells W. Hagen; Pieter Kruit; Peter Crozier

doi:10.1021/nl050522i

Approaching the resolution limit of nanometer-scale electron beam-induced deposition

Willem F. Van Dorp, Bob Van Someren, Cornells W. Hagen, Pieter Kruit, Peter Crozier

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

246 Scopus citations

Abstract

We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.

Original language	English (US)
Pages (from-to)	1303-1307
Number of pages	5
Journal	Nano Letters
Volume	5
Issue number	7
DOIs	https://doi.org/10.1021/nl050522i
State	Published - Jul 2005

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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abstract = "We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.",

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T1 - Approaching the resolution limit of nanometer-scale electron beam-induced deposition

AU - Van Dorp, Willem F.

AU - Van Someren, Bob

AU - Hagen, Cornells W.

AU - Kruit, Pieter

AU - Crozier, Peter

PY - 2005/7

Y1 - 2005/7

N2 - We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.

AB - We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.

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Approaching the resolution limit of nanometer-scale electron beam-induced deposition

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