Absolute measurement of normalized thickness, t/λi, from off-axis electron holography

Martha McCartney, M. Gajdardziska-Josifovska

Research output: Contribution to journalArticlepeer-review

137 Scopus citations


A simple method is described for determination of the quantity t/λi from off-axis electron holograms, where t is the local thickness and λi is the mean-free-path for inelastic scattering of high energy electrons. The method uses the energy-filtered amplitude reconstructed from a hologram and, when applied to samples with well characterized geometry, allows measurement of the inelastic mean-free-path. Measured values of 71 ± 5 nm for MgO and 92 ± 7 nm for Si for 100 keV beam energy compare favorably with calculated and experimental values from electron-energy-loss spectroscopy. Differences between the two techniques for determining t/λi and the utility of the holographic method are briefly discussed.

Original languageEnglish (US)
Pages (from-to)283-289
Number of pages7
Issue number3
StatePublished - Mar 1994

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation


Dive into the research topics of 'Absolute measurement of normalized thickness, t/λi, from off-axis electron holography'. Together they form a unique fingerprint.

Cite this