A new approach to fabricating high density nanoarrays by nanocontact printing

Jian Gu, Xiaoyin Xiao, Bharath R. Takulapalli, Michael E. Morrison, Peiming Zhang, Frederic Zenhausern

Research output: Contribution to journalArticlepeer-review

19 Scopus citations


The authors introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub- 500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. They also demonstrate that they can image a nanoarray labeled by streptavidin by atomic force microscope.

Original languageEnglish (US)
Pages (from-to)1860-1865
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - 2008

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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